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機(jī)械剝離單層二硫化鎢薄膜

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公司名稱 上海巨納科技有限公司
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更新時間 2020/12/26 15:06:11
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促銷詳情

促銷時間：

特價說明：

促銷詳細(xì)：

2020年01月08日至 2020年02月08日

特價促銷

模內(nèi)澆口分離自動化，降低對人的依賴度；傳統(tǒng)的塑膠模具開模后產(chǎn)品與澆口相連，需二道工序進(jìn)行人工剪切分離，模內(nèi)熱切模具將澆口分離提前至開模前，消除后續(xù)工序，有利于生產(chǎn)自動化，降低對人的依賴。

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Monolayer tungsten disulfide （1H-WS?） flakes have been exfoliated from bulk tungsten disulfide （2H-WS?） onto 90nm thermal oxide and measures from 5micron up to 40micron in size.

詳細(xì)信息在線詢價

Monolayer tungsten disulfide (1H-WS?) flakes have been exfoliated from bulk tungsten disulfide (2H-WS?) onto 90nm thermal oxide and measures from 5micron up to 40micron in size. Each sample contains at least one single-layer WS? and is easy to find with the given x and y coordinates. Full characterization is performed on each monolayer flake. Typically, single-layer WS? show strong PL at 2.02eV with 0.04 to 0.08eV FWHM, All the data is provided with the sample and data includes Raman, photoluminescence, 100x optical images, and x,y coordinates.

Photoluminescence (PL): In the single layer form, tungsten diselenide possesses direct band-gap at 2.02eV. PL measurements show strong PL peak located at 2.02V with 0.04-0.08 eV PL FWHM.

Optical Microscope images: Each sample is inspected under the optical microscope and x-y coordinates are recorded.

Possible applications:

Electronics
Sensors - detectors
Optics
STM - AFM applications
Molecular detection - binding
Ultra-low friction studies
Materials science and semiconductor research